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氧化鎵中缺陷擴展及模型Defect Expansion and Model in Gallium Oxide張赫之大連理工大學副教授ZHANG HezhiAssociate Professor, Dalian University of Technology

超寬禁帶半導體氧化鎵和氮化鋁特性研究Research on the Characteristics of Ultra-wide Bandgap Semiconductor GaO and AlN張道華深圳平湖實驗室第四代半導體首席科學家、新加坡工程院院士ZHANG DaohuaChief Scientist of Fourth-generation Semiconductors of Shenzhen Pinghu Laboratory, Academician the Academy of Engineering, Singapore

氧化鎵高導熱異質集成射頻器件High Thermal Conductivity Heterogeneous Integrated RF Devices for Ga?O?葉建東南京大學教授YE JiandongProfessor of Nanjing University

氧化鎵材料和電子器件的熱特性Thermal Characteristics of Ga2O3Materials and Electronic Devices孫華銳哈爾濱工業(yè)大學（深圳）教授，理學院副院長SUN HuaruiProfessor of Harbin Institute of Technology, Shenzhen

氧化鎵PECVD外延生長及光電信息感知器件研究Research on PECVD Epitaxial Growth of Gallium Oxide and the Photoelectric Information Sensing Devices李山南京郵電大學副教授、蘇州鎵和半導體研發(fā)總監(jiān)LI ShanAssociate Professor, Nanjing University of Posts and Telecommunications, RD director of Suzhou GAO Semiconductor Co. Ltd.

超寬禁帶半導體氧化鎵及金剛石的晶體生長模擬研究Modeling of ultrawide Bandgap Semiconductor crystal growth for Gallium oxide and Diamond付昊蘇州思體爾軟件科技有限公司副總經理Henry FUVice General Manager of SuZhou STR Software Technology Co., Ltd.

氧化鎵異質結功率晶體管Gallium Oxide Heterogeneous and Heterojunction Power Transistors韓根全西安電子科技大學教授HAN GenquanProfessor of Xidian University

面向柔性和垂直電子器件的外延氧化鎵薄膜Epitaxial Ga2O3 thin film membrane for flexible and vertical electronics李曉航沙特阿卜杜拉國王科技大學副教授（陸義代講）LI XiaohangAssociate Professor at King Abdullah University of ScienceTechnology

氧化鎵功率器件耐壓和功率優(yōu)值的研究Research on Voltage Withstandand Power Optimum Value of Ga2O3 Power Devices張進成西安電子科技大學副校長、教授（團隊代講）

SiC MOS器件氧化后退火新途徑低溫再氧化退火技術A new approach of post-oxidation annealing for SiC MOS devices -- the low-temperature re-oxidation annealing technology王德君大連理工大學教授Wang DejunProfessor of Dalian University of Technology

日本國立佐賀大學同步輻射光應用研究中心主任、電氣電子系教授郭其新帶來了題為超寬禁帶氧化半導體的生長和特性的主題報告。郭其新主要從事半導體材料制備與表征，同步輻射光應用研究。報告中主要介紹了Ga2O3等寬禁帶氧化半導體薄膜的生長和特性。通過對于In和Al元素的調整我們可以調整Ga2O3或Ga2O3薄膜的能帶寬度。研究制備了Ga2O3:Er/Si LED，其驅動電壓稍微比ZnO:Er/Si或者GaN:Er/Si的要低。同時，還研究了Eu摻雜的Ga2O3薄膜的